Journal of Modern Physics

Journal of Modern Physics

ISSN Print: 2153-1196
ISSN Online: 2153-120X
www.scirp.org/journal/jmp
E-mail: jmp@scirp.org
"Nano-Coating Process for Si [1 0 0] Wafer Using Atmospheric Pressure Plasma Jet (APPJ)"
written by Ahmed Rida Galaly,
published by Journal of Modern Physics, Vol.3 No.9, 2012
has been cited by the following article(s):
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[2] Plasma parameters and electric field fluctuations in a cold micro-plasma jet interacting with a substrate
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[3] Role of helium metastable state in the interaction between He atmospheric pressure plasma jet and ns pulsed laser
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[4] Non-Thermal Plasma Treatment Coupled with a Photocatalyst for Antimicrobial Performance of Ihram Cotton Fabric. Nanomaterials 2022, 12, 1004
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[5] Non-Thermal Plasma Treatment Coupled with a Photocatalyst for Antimicrobial Performance of Ihram Cotton Fabric
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[6] Determination of electron properties of a helium atmospheric pressure plasma jet with a grounded metallic target
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[7] Fabrication of Repellent Fabrics using Plasma Grafted Siloxanes.
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[8] Characterstics of ultra low frequancy plasma (ULFP) producing cathode etching process
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[9] Study of the etching processes of Si [1 0 0] wafer using ultra low frequency plasma
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[10] Inactivation of bacteria using combined effects of magnetic field, low pressure and ultra low frequency plasma discharges (ULFP)
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[11] Dust Plasma Effect on the Etching Process of Si [100] by Ultra Low Frequency RF Plasma
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[12] Characteristics of ultra low frequency plasma (ULFP) producing cathode etching process
Int. J. Multidisciplinary Res. Adv. Eng, 2013
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