World Journal of Condensed Matter Physics

World Journal of Condensed Matter Physics

ISSN Print: 2160-6919
ISSN Online: 2160-6927
www.scirp.org/journal/wjcmp
E-mail: wjcmp@scirp.org
"IR Spectroscopic Study of Silicon Nitride Films Grown at a Low Substrate Temperature Using Very High Frequency Plasma-Enhanced Chemical Vapor Deposition"
written by Shin-ichi Kobayashi,
published by World Journal of Condensed Matter Physics, Vol.6 No.4, 2016
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