"Effects of Si-Layer-Thickness Ratio on UV-Light-Emission Intensity from Si/SiO2 Multilayered Thin Films Prepared Using Radio-Frequency Sputtering"
written by Kenta Miura, Hitomi Hoshino, Masashi Honmi, Osamu Hanaizumi,
published by Materials Sciences and Applications, Vol.6 No.3, 2015
has been cited by the following article(s):