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Journal of Crystallization Process and Technology

Journal of Crystallization Process and Technology

Journal of Crystallization Process and Technology

ISSN Print: 2161-7678
ISSN Online: 2161-7686
www.scirp.org/journal/jcpt
E-mail: jcpt@scirp.org
"Drastic Resistivity Reduction of CVD-TiO2 Layers by Post-Wet-Treatment in HCl Solution"
written by Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama,
published by Journal of Crystallization Process and Technology, Vol.5 No.1, 2015
has been cited by the following article(s):
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