Advances in Chemical Engineering and Science

Advances in Chemical Engineering and Science

ISSN Print: 2160-0392
ISSN Online: 2160-0406
www.scirp.org/journal/aces
E-mail: aces@scirp.org
"Properties of Titanium Oxynitride Prepared by RF Plasma"
written by Fayez M. El-Hossary, Niemat Z. Negm, Ahmed M. Abd El-Rahman, Mohamed Raaif, Alzahraa A. Abd Elmula,
published by Advances in Chemical Engineering and Science, Vol.5 No.1, 2015
has been cited by the following article(s):
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[6] Optical Properties of Nanocrystalline/Amorphous TiO2 Thin Film Deposited by rf Plasma Magnetron Sputtering.
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[9] Reactive Magnetron Sputter Deposition of Titanium Oxynitride TiNxOy Coatings: Influence of Substrate Bias Voltage on the Structure, Composition, and Properties
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[12] Plasma-assisted Nitrogen Fixation in Nanomaterials: Fabrication, Characterization and Application
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[13] Titanium nitride formation by a dual-stage femtosecond laser process
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[14] Surface Modification of Q195 Structure Carbon Steel by Electrolytic Plasma Processing
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[15] Synthesis of Nanostructure TiO2 Films Using Different Applied Powers of Pulsed Magnetron Sputtering
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[16] Electrolytic plasma processing-an innovative treatment for surface modification of 304 stainless steel
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[17] Surface modification by electrolytic plasma processing for high Nb-TiAl alloys
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[18] Optical properties of metal oxynitride thin films grown with atmospheric plasma deposition
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