"Low Pressure Chemical Vapor Deposition of Nb and F Co-Doped TiO2 Layer"
written by Satoshi Yamauchi, Shouta Saiki, Kazuhiro Ishibashi, Akie Nakagawa, Sakura Hatakeyama,
published by Journal of Crystallization Process and Technology, Vol.4 No.2, 2014
has been cited by the following article(s):
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