Journal of Surface Engineered Materials and Advanced Technology

Journal of Surface Engineered Materials and Advanced Technology

ISSN Print: 2161-4881
ISSN Online: 2161-489X
www.scirp.org/journal/jsemat
E-mail: jsemat@scirp.org
"Epitaxial Ge Growth on Si(111) Covered with Ultrathin SiO2 Films"
written by Alexander A. Shklyaev, Konstantin N. Romanyuk, Alexander V. Latyshev,
published by Journal of Surface Engineered Materials and Advanced Technology, Vol.3 No.3, 2013
has been cited by the following article(s):
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[1] Effect of deposition conditions on the thermal stability of Ge layers on SiO2 and their dewetting behavior
2020
[2] Single-step fabrication of homoepitaxial silicon nanocones by molecular beam epitaxy
Applied Surface Science, 2018
[3] Surface Morphologies Obtained by Ge Deposition on Bare and Oxidized Silicon Surfaces at Different Temperatures
Advances in Semiconductor Nanostructures, 2017
[4] Photo-sensitive Ge nanocrystal based films controlled by substrate deposition temperature
Semiconductor Science and Technology, 2017
[5] Formation of lateral nanowires by Ge deposition on Si (111) at high temperatures
Journal of Crystal Growth, 2016
[6] Formation and optical properties of Ge films grown on Si (111) substrates using nanocontact epitaxy
Applied Surface Science, 2015
[7] Formation and optical properties of Ge films grown on Si (1 1 1) substrates using nanocontact epitaxy
Applied Surface Science, 2015
[8] Тонкие монокристаллические слои Ge на 2-дюймовых подложках Si
Письма в ЖТФ, 2015
[9] Strain-induced Ge segregation on Si at high temperatures
Journal of Crystal Growth, 2015
[10] Энергетический спектр электронов и особенности оптического поглощения однослойных гидроксисилоксановых структур с дефектами замещения силанольных групп электронодонорными атомами/Литинский АО, Нгуен Тхи Ша
Известия ВолгГТУ. Серия «Электроника, измерительная техника, радиотехника и связь, 2015
[11] Properties of three-dimensional structures prepared by Ge dewetting from Si (111) at high temperatures
Journal of Applied Physics, 2015
[12] Thin single-crystal Ge layers on 2 ″Si substrates
Technical Physics Letters, 2015
[13] HIGH EFFICIENCY MATERIALS BASED ON Ge FOR HIGH SPEED DEVICES
2015
[14] Mechanisms of surface morphology formation during Ge growth on Si (100) at high temperatures
Micro/Nanotechnologies and Electron Devices (EDM), 2015 16th International Conference of Young Specialists on, 2015
[15] Энергетический спектр электронов и особенности оптического поглощения однослойных гидроксисилоксановых структур с дефектами замещения …
2014
[16] Энергетический спектр электронов и особенности оптического поглощения однослойных гидроксисилоксановых структур с дефектами замещения …
2014
[17] Surface morphology formation of Ge layers on Si (111) under high-temperature annealing
Micro/Nanotechnologies and Electron Devices (EDM), 2014 15th International Conference of Young Specialists on. IEEE, 2014
[18] Surface morphology of Ge layers epitaxially grown on bare and oxidized Si (001) and Si (111) substrates
Surface Science.Elsevier, 2014
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