has been cited by the following article(s):
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[1]
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Improving structural, optical, and electrical properties of μc-Si: H using non-uniform hydrogen dilution treatment on RF-PECVD prepared layers
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2021 |
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[2]
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МЕТОДИКА ИЗМЕРЕНИЯ КОНЦЕНТРАЦИИ МОЛЕКУЛ Н2О И ОН В ОБЪЕМЕ ВАКУУМИРОВАННЫХ КВАРЦЕВЫХ РЕЗОНАТОРОВ
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2020 |
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[3]
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Local Surface Electric Field's Effect on Adsorbed Proteins' Orientation
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2019 |
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[4]
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Optical and Microstructural Properties of Sputtered Thin Films for Photovoltaic Applications
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2019 |
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[5]
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The Variation of Crystalline Structure Induced by Gas Dilution and Thermal Annealing in Silicon Layers Deposited by PECVD Technique
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2018 |
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[6]
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Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition
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Thin Solid Films,
2018 |
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[7]
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The effects of argon and helium dilution in the growth of nc-Si: H thin films by plasma-enhanced chemical vapor deposition
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Journal of Materials Science,
2018 |
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[8]
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Light‐Induced Reversible Optical Properties of Hydrogenated Amorphous Silicon: A Promising Optically Programmable Photonic Material
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physica status solidi (a),
2018 |
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[9]
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Characterization and modeling of electrical transport in undoped hydrogenated microcrystalline silicon
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Journal of Non-Crystalline Solids,
2017 |
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[10]
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Plasma-deposited hydrogenated amorphous silicon films: multiscale modelling reveals key processes
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RSC Advances,
2017 |
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[11]
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Nanostructure evolution of magnetron sputtered hydrogenated silicon thin films
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AIP Conference Proceedings,
2017 |
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[12]
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Improving Memory Characteristics of Hydrogenated Nanocrystalline Silicon Germanium Nonvolatile Memory Devices by Controlling Germanium Contents
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Journal of Nanoscience and Nanotechnology,
2016 |
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[13]
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Mixed phase silicon thin films grown at high rate using 60MHz assisted VHF-PECVD technique
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Materials Science in Semiconductor Processing,
2015 |
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[14]
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Mixed phase silicon thin films grown at high rate using 60 MHz assisted VHF-PECVD technique
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Materials Science in Semiconductor Processing,
2015 |
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[15]
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Structural analysis of hydrogenated nanocrystalline silicon thin films as a function of substrate temperature during deposition
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The European Physical Journal Applied Physics,
2014 |
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[1]
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Development and Characterization of SDS Doped Poly(aniline-co-2-isopropylaniline)
MWCNT/CuO Nanocomposites for Electrochemical Supercapacitor Application
Asian Journal of Chemistry,
2020
DOI:10.14233/ajchem.2020.22681
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[2]
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Local Surface Electric Field’s Effect on Adsorbed Proteins’ Orientation
Surfaces,
2019
DOI:10.3390/surfaces2020030
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[3]
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Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition
Thin Solid Films,
2018
DOI:10.1016/j.tsf.2017.10.031
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[4]
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The Variation of Crystalline Structure Induced by Gas Dilution and Thermal Annealing in Silicon Layers Deposited by PECVD Technique
Silicon,
2018
DOI:10.1007/s12633-018-0025-8
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[5]
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Nanostructure evolution of magnetron sputtered hydrogenated silicon thin films
Journal of Applied Physics,
2017
DOI:10.1063/1.4998455
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