World Journal of Nano Science and Engineering

World Journal of Nano Science and Engineering

ISSN Print: 2161-4954
ISSN Online: 2161-4962
www.scirp.org/journal/wjnse
E-mail: wjnse@scirp.org
"New Model for Drain and Gate Current of Single-Electron Transistor at High Temperature"
written by Amine Touati, Samir Chatbouri, Nabil Sghaier, Adel Kalboussi,
published by World Journal of Nano Science and Engineering, Vol.2 No.4, 2012
has been cited by the following article(s):
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