Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microelectronic Application

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ISSN Print: 2327-4077
ISSN Online: 2327-4085
www.scirp.org/Journal/jmmce
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"Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microelectronic Application"
written by V. VasanthiPillay, K. Vijayalakshmi,
published by Journal of Minerals and Materials Characterization and Engineering, Vol.11 No.7, 2012

has been cited by the following article(s):

[1]	Estudio de la heteroestructura GaN/AIN/Si (111) crecidas por epitaxia de haces moleculares
	2022

[2]	Growth, structural and electrical properties of AlN/Si (111) for futuristic MEMS applications
	2021

[3]	Electrical and structural characteristics of sputtered c-oriented AlN thin films on Si (100) and Si (110) substrates
	Thin Solid Films, 2018

[4]	Influence of Process Parameters and Formation of Highly c-Axis Oriented AlN Thin Films on Mo by Reactive Sputtering
	Journal of Electronic Materials, 2018

[5]	Growth defects in CrN/NbN coatings deposited by HIPIMS/UBM techniques
	2017

[6]	Growth Defects in CrN/NbN Coatings Deposited by HIPIMS/UBM technique
	2017

[7]	Effect of chamber pressure on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings
	Surface and Coatings Technology, 2017

[8]	Study of Coating Defects and their Influence on Corrosion and Tribological Properties of HIPIMS Deposited CrN/NbN Coatings
	60th Annual Technical Conference Proceedings Providence, Rhode Island, 2017

[9]	Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
	Semiconductor Science and Technology, 2016

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