X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering

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World Journal of Nano Science and Engineering

ISSN Print: 2161-4954
ISSN Online: 2161-4962
www.scirp.org/journal/wjnse
E-mail: wjnse@scirp.org

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"X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering"
written by Masao Matsuoka, Sadao Isotani, Ronaldo D. Mansano, Wilmer Sucasaire, Ricardo A. C. Pinto, Juan C. R. Mittani, Kiyoshi Ogata, Naoto Kuratani,
published by World Journal of Nano Science and Engineering, Vol.2 No.2, 2012

has been cited by the following article(s):

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