Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus

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ISSN Print: 2162-531X
ISSN Online: 2162-5328
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"Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus"
written by V. N. Demin, V. O. Borisov, G. N. Grachev, A. L. Smirnov, M. N. Khomyakov, S. N. Bagayev,
published by Advances in Materials Physics and Chemistry, Vol.11 No.7, 2021

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