has been cited by the following article(s):
[1]
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Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering
Journal of Vacuum Science & Technology B,
2023
DOI:10.1116/6.0002377
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[2]
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Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering
Journal of Vacuum Science & Technology B,
2023
DOI:10.1116/6.0002377
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[3]
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Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode
The European Physical Journal Applied Physics,
2019
DOI:10.1051/epjap/2019180193
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[4]
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Reactive-ion etching of nylon fabric meshes using oxygen plasma for creating surface nanostructures
Applied Surface Science,
2015
DOI:10.1016/j.apsusc.2015.06.185
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