The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO<sub>2</sub>

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ISSN Print: 2333-9705
ISSN Online: 2333-9721
www.scirp.org/journal/oalibj
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"The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO₂"
written by Badra Bouabdallah, Yamina Bourezig, Zakia Nabi, Saliha Kheris, Boucif Benichou, Omar Benhelal,
published by Open Access Library Journal, Vol.1 No.3, 2014

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