"Pulsed Supermagnetron Plasma CVD of a-CNx:H Electron-Transport Films for Au/a-CNx:H/p-Si Photovoltaic Cells"
written by Haruhisa Kinoshita, Hiroyuki Suzuki,
published by Journal of Modern Physics, Vol.2 No.5, 2011
has been cited by the following article(s):
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[2] Fowler-Nordheim Tunneling, Photovoltaic Applications and New Band Structure Models of Electroconductive a-CNx: H Films Formed by Supermagnetron …
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[3] A Revival of Waste: Atmospheric Pressure Nitrogen Plasma Jet Enhanced Jumbo Silicon/silicon Carbide Composite in Lithium Ion Batteries
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[4] Chemical vapor deposition of a-CNx: H films for electron field emission using band supermagnetron plasma
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[5] Deposition of a-CNx: H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field
Journal of Modern Physics, 2013
[6] Deposition of a-CN x: H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field
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[7] N2 or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNx Films for Application to Elementary Amorphous CNx: H/p- …
Japanese Journal of Applied Physics, 2013
[8] N2 or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNx Films for Application to Elementary Amorphous CNx: H/p …
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[9] N2 or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNx Films for Application to Elementary Amorphous CNx: H/p-Si Photovoltaic Cell
Japanese Journal of Applied Physics, 2013
[10] Isobutane/N2 Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission …
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[11] Deposition of amorphous carbon films using Ar and/or N2 magnetron sputter with ring permanent magnet
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[12] Isobutane/N2 Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission …
Japanese Journal of Applied Physics, 2012
[13] Deposition of amorphous carbon films using Ar and/or N< sub> 2 magnetron sputter with ring permanent magnet
Thin Solid Films, 2012
[14] Isobutane/N2 Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications
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