Dependence of Atomic-Scale Si(110) Surface Roughness on Hydrogen Introduction Temperature after High-Temperature Ar Annealing

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ISSN Print: 2161-4881
ISSN Online: 2161-489X
www.scirp.org/journal/jsemat
E-mail: jsemat@scirp.org

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"Dependence of Atomic-Scale Si(110) Surface Roughness on Hydrogen Introduction Temperature after High-Temperature Ar Annealing"
written by Koji Araki, Ryuji Takeda, Haruo Sudo, Koji Izunome, Xinwei Zhao,
published by Journal of Surface Engineered Materials and Advanced Technology, Vol.4 No.5, 2014

has been cited by the following article(s):

[1]	Influence of fast neutron irradiation on the phase composition and optical properties of homogeneous SiO x and composite Si–SiO x thin films
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[2]	H2 ANNEAL FOR SIDEWALL ROUGNESS REDUCTION IN INDUSTRIAL SETTING FOR MEMS MICROFABRICATION
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[3]	Effect of Surface Silanol Groups on Friction and Wear between Amorphous Silica Surfaces
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[4]	RECUIT À L'HYDROGÈNE POUR LA RÉDUCTION DE LA RUGOSITÉ DES PAROIS DANS UN CONTEXTE INDUSTRIEL DE MICROFABRICATION DE MEMS
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[5]	Growth and Self-Assembly of Silicon–Silicon Carbide Nanoparticles into Hybrid Worm-Like Nanostructures at the Silicon Wafer Surface
	2018

[6]	Molecular Dynamics Study of Alkylsilane Monolayers on Realistic Amorphous Silica Surfaces
	Langmuir, 2015

[1]	Effect of Surface Silanol Groups on Friction and Wear between Amorphous Silica Surfaces Langmuir, 2019 DOI:10.1021/acs.langmuir.8b04291

[2]	Effect of Surface Silanol Groups on Friction and Wear between Amorphous Silica Surfaces Langmuir, 2019 DOI:10.1021/acs.langmuir.8b04291

[3]	Growth and Self-Assembly of Silicon–Silicon Carbide Nanoparticles into Hybrid Worm-Like Nanostructures at the Silicon Wafer Surface Nanomaterials, 2018 DOI:10.3390/nano8110954

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