Numerical Calculations of Some Plasma Parameters of the Capacitively Coupled <i>RF</i> Discharge

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ISSN Print: 2153-1196
ISSN Online: 2153-120X
www.scirp.org/journal/jmp
E-mail: jmp@scirp.org

"Numerical Calculations of Some Plasma Parameters of the Capacitively Coupled RF Discharge"
written by Mohamed Ali Hassouba, Ahmed Rida Galaly, Usama Mohamed Rashed,
published by Journal of Modern Physics, Vol.5 No.8, 2014

has been cited by the following article(s):

[1]	Optimal Discharge Parameters for Biomedical Surface Sterilization in Radiofrequency AR/O2 Plasma
	Energies, 2022

[2]	Fine-tunable plasma nano-machining for fabrication of 3D hollow nanostructures: SERS application
	Nanotechnology, 2017

[1]	A collisional global sheath – Bulk model of argon plasma for semiconductor scale manufacturing Alexandria Engineering Journal, 2023 DOI:10.1016/j.aej.2022.12.035

[2]	A collisional global sheath – Bulk model of argon plasma for semiconductor scale manufacturing Alexandria Engineering Journal, 2023 DOI:10.1016/j.aej.2022.12.035

[3]	Optimal Discharge Parameters for Biomedical Surface Sterilization in Radiofrequency AR/O2 Plasma Energies, 2022 DOI:10.3390/en15041589

[4]	Fine-tunable plasma nano-machining for fabrication of 3D hollow nanostructures: SERS application Nanotechnology, 2017 DOI:10.1088/1361-6528/aa78e9

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