Journal of Crystallization Process and Technology

Journal of Crystallization Process and Technology

ISSN Print: 2161-7678
ISSN Online: 2161-7686
www.scirp.org/journal/jcpt
E-mail: jcpt@scirp.org
"Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature"
written by Satoshi Yamauchi, Hiromi Suzuki, Risa Akutsu,
published by Journal of Crystallization Process and Technology, Vol.4 No.1, 2014
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