Engineering

Engineering

ISSN Print: 1947-3931
ISSN Online: 1947-394X
www.scirp.org/journal/eng
E-mail: eng@scirp.org
"A New Model for the Etching Characteristics of Corners Formed by Si{111} Planes on Si{110} Wafer Surface"
written by Prem Pal, Sajal Sagar Singh,
published by Engineering, Vol.5 No.11A, 2013
has been cited by the following article(s):
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[1] Optimization of corner compensations in wet etching of silicon for a MEMS Z-axis accelerometer
Microelectronic Engineering, 2022
[2] Wet bulk micromachining characteristics of Si {110} in NaOH-based solution
Journal of …, 2022
[3] A compensating method of convex corner in etching of (110) silicon
Microsystem Technologies, 2022
[4] An arrayed-window microfluidic device for observation of mixed nanoparticles with an X-ray free-electron laser
Optical Review, 2022
[5] Design of Convex Corner Compensation Pattern in Manufacturing of Si Diaphragms
Solid State Electronics Letters, 2022
[6] High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
2021
[7] Silicon field emitters fabricated by dicing-saw and wet-chemical-etching
2021
[8] Electron Diagnostics for Extreme High Brightness Nano-Blade Field Emission Cathodes
2019
[9] Aging Effects of KOH+ NH2OH Solution on the Etching Characteristics of Silicon
2019
[10] Effective improvement in the etching characteristics of Si {110} in low concentration TMAH solution
Micro & Nano Letters, 2018
[11] Microstructures with Protected Convex Corners in Modified KOH Solution Exhibiting High-Speed Silicon Etching
2018
[12] Silicon wet bulk micromachining for MEMS
2017
[13] Etching characteristics of Si {110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS
Micro and Nano Systems Letters, 2017
[14] High Speed Surface Illuminated Si Photodiode Using Microstructured Holes for Absorption Enhancements at 900–1000 nm Wavelength
ACS Photonics, 2017
[15] Effect of NH2OH on Etching Characteristics of Si {100} in KOH Solution
2017
[16] Silicon-on-sapphire (SOS) waveguide modal analysis for mid-infrared applications
Journal of Physics Communications, 2017
[17] A measurement free pre-etched pattern to identify the< 110> directions on Si {110} wafer
Microsystem Technologies, 2016
[18] Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMS
Micro and Nano Systems Letters, 2016
[19] Fabrication of silicon nanowires with controlled nano-scale shapes using wet anisotropic etching
2015
[20] A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching
Micro and Nano Systems Letters, 2015
[21] A detailed investigation and explanation of the appearance of different undercut profiles in KOH and TMAH
Journal of Micromechanics and Microengineering, 2014
[22] Anisotropic etching on Si {1 1 0}: experiment and simulation for the formation of microstructures with convex corners
Journal of Micromechanics and Microengineering, 2014
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