Microstructure and 355 nm Laser-Induced Damage Characteristics of Al<sub>2</sub>O<sub>3</sub> Films Irradiated with Oxygen Plasma under Different Energy

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ISSN Print: 2160-8881
ISSN Online: 2160-889X
www.scirp.org/journal/opj
E-mail: opj@scirp.org

"Microstructure and 355 nm Laser-Induced Damage Characteristics of Al₂O₃ Films Irradiated with Oxygen Plasma under Different Energy"
written by Dongping Zhang, Yan Li, Jingting Luo, Zhuanghao Zheng, Guangxing Liang, Xingmin Cai, Fan Ye, Ping Fan, Jianjun Huang,
published by Optics and Photonics Journal, Vol.3 No.2, 2013

has been cited by the following article(s):

[1]	Influence of substrate surface properties on laser-induced damage properties of TiO 2 thin films.
	International Journal of Multiphysics, 2016

[2]	Al2O3 薄膜的性能, 制备与应用
	真空, 2016

[3]	Influence of substrate surface properties on laser-induced damage properties of TiO2 thin films
	2016

[4]	Al_2O_3 薄膜的性能, 制备与应用
	2016

[5]	Laser damage properties of films with different surface accuracy of substrates
	7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014). International Society for , 2014

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