"XRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition"
written by N. Matsunami, H. Kakiuchida, M. Sataka, S. Okayasu,
published by Advances in Materials Physics and Chemistry, Vol.3 No.1A, 2013
has been cited by the following article(s):
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[27] Growth and Characterization of Aln Thin Film Deposited by Sol-Gel Spin Coating Techniques
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[28] Surface characterization and luminescence properties of AlN doped with RE elements (Sm, Ho, Gd, Tm)
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