"Plasma-Assisted Chemical Vapor Deposition of TiO2 Thin Films for Highly Hydrophilic Performance"
written by Satoshi Yamauchi, Yoh Imai,
published by Crystal Structure Theory and Applications, Vol.2 No.1, 2013
has been cited by the following article(s):
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[2] Characterization of TiO x Thin Films Fabricated by Plasma-Enhanced Chemical Vapor Deposition for Hard-Mask Applications in Semiconductor Devices
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[5] Study of Gas-Phase Reactions in TiO₂ Production and Functionalised Thin Films
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[7] Fabrication of a metal oxide layer on a multi-walled carbon nanotube surface by in-flight coating using gas-phase deposition
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[8] Rhodamine-based ratiometric fluorescent probes based on excitation energy transfer mechanisms: construction and applications in ratiometric sensing
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[9] 热处理对 TiO2 薄膜制备及亲水性的影响
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[10] 热处理对 TiO 2 薄膜制备及亲水性的影响
[11] Catalytic low-temperature combustion of dichloromethane over V–Ni/TiO 2 catalyst
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[12] Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature
Journal of Crystallization Process and Technology?, 2014
[13] Evaluation of interfacial water on super-hydrophilic surface by THz-TDS
Infrared, Millimeter, and Terahertz Waves (IRMMW-THz), 2013 38th International Conference on. IEEE, 2013., 2013