Crystal Structure Theory and Applications

Crystal Structure Theory and Applications

ISSN Print: 2169-2491
ISSN Online: 2169-2505
www.scirp.org/journal/csta
E-mail: csta@scirp.org
"Amorphous-Nanocrystalline Transition in Silicon Thin Films Obtained by Argon Diluted Silane PECVD"
written by Rachid Amrani, Frederic Pichot, Larbi Chahed, Yvan Cuminal,
published by Crystal Structure Theory and Applications, Vol.1 No.3, 2012
has been cited by the following article(s):
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[11] Role of Laser Power, Wavelength, and Pulse Duration in Laser Assisted Tin-Induced Crystallization of Amorphous Silicon
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[13] Tin-induced crystallization of amorphous silicon assisted by a pulsed laser irradiation
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[15] Characterization and modeling of electrical transport in undoped hydrogenated microcrystalline silicon
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[16] Physical Vapor Deposition for Tin-Induced and Laser Crystallization
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[17] Nanostructured semiconductors: amorphization and thermal properties
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[18] Комбінаційне розсіювання світла в процесі індукованої оловом кристалізації аморфного кремнію
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[19] Nanocrystals Growth Control during Laser Annealing of Sn:(α-Si) Composites
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[20] Effect of RF power density on micro-and macro-structural properties of PECVD grown hydrogenated nanocrystalline silicon thin films
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[21] RAMAN SCATTERING IN THE PROCESS OF TIN-INDUCED CRYSTALLIZATION OF AMORPHOUS SILICON
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[22] Mixed phase silicon thin films grown at high rate using 60MHz assisted VHF-PECVD technique
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[23] Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
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