Effects of Si-Layer-Thickness Ratio on UV-Light-Emission Intensity from Si/SiO2 Multilayered Thin Films Prepared Using Radio-Frequency Sputtering ()
Affiliation(s)
ABSTRACT
KEYWORDS
Share and Cite:
Copyright © 2024 by authors and Scientific Research Publishing Inc.
This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.