Author(s)

Yonic Peñaloza-Mendoza, Luis Ponce-Cabrera

Instituto Politecnico Nacional, Cicata Altamira, Altamira, México.

TiO₂ thin films were prepared on glass substrates using the PLD (Pulsed Laser Deposition) technique. In order to carry out the ablation process, a Nd:YAG laser was used emitting in 1064 nm wavelength at 10 Hz repetition rate, set up for operating in both single-pulse and multi-pulse regimes. A comparison of the deposition rate, the optical and morphological properties of the layers obtained from both ablation regimes was made, which showed that the multi-pulsed ablation produced layers with a higher surface quality and better optical properties.

Pulsed Laser Deposition, Single-Pulse Ablation, Multi-Pulse Ablation, TiO₂ Thin Film

Peñaloza-Mendoza, Y. and Ponce-Cabrera, L. (2015) Comparison on Morphological and Optical Properties of TiO₂ Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation. Journal of Surface Engineered Materials and Advanced Technology, 5, 17-23. doi: 10.4236/jsemat.2015.51002.