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Diamond Particles Deposited among Nickel/Copper Particles in Energy Controlled CH4/H2 RF Discharge Plasmas

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DOI: 10.4236/jsemat.2012.23025    3,659 Downloads   5,694 Views Citations

ABSTRACT

Formation of diamond particles was investigated in an energy-controlled CH4/H2 radio-frequency (RF) discharge plasma. Here, in particular, it was examined how diamond particles grew on a nickel substrate under an influence of Cu vapor that was supplied from a heated Cu wire. Here, the plasma was generated by a hollow-magnetron-type (HMT) RF plasma source at the frequency of 13.56 MHz. Total pressure was kept at 100 mTorr. Diamond particles grew besides Ni and Cu particles. From Raman spectrum the substrate surface was covered with thin graphite film deposited as a background layer. It was shown that diamond could grow in a self-organized manner even when the other atomic gas species such as Ni and Cu were contained in the gas at the same time during the growth process.

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J. Emi and S. Iizuka, "Diamond Particles Deposited among Nickel/Copper Particles in Energy Controlled CH4/H2 RF Discharge Plasmas," Journal of Surface Engineered Materials and Advanced Technology, Vol. 2 No. 3, 2012, pp. 158-162. doi: 10.4236/jsemat.2012.23025.

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