Article citationsMore>>

R. Castagne and A. Vapaille, “Description of the SiO2-Si Interface Properties by Means of very Low Frequency MOS Capacitance Measurements,” Surface Science, Vol. 28, No. 1, 1971, pp. 157-193, doi:10.1016/0039-6028(71)90092-6

has been cited by the following article:

Follow SCIRP
Twitter Facebook Linkedin Weibo
Contact us
+1 323-425-8868
customer@scirp.org
WhatsApp +86 18163351462(WhatsApp)
Click here to send a message to me 1655362766
Paper Publishing WeChat
Free SCIRP Newsletters
Copyright © 2006-2024 Scientific Research Publishing Inc. All Rights Reserved.
Top