TITLE:
Design Consideration in the Development of Multi-Fin FETs for RF Applications
AUTHORS:
Peijie Feng, Prasanta Ghosh
KEYWORDS:
FinFET; Analog; RF; Source/Drain Extension Region Engineering; Simulation; Multi-Fin FET
JOURNAL NAME:
World Journal of Nano Science and Engineering,
Vol.2 No.2,
June
22,
2012
ABSTRACT: In this paper, we propose multi-fin FET design techniques targeted for RF applications. Overlap and underlap design configuration in a base FinFET are compared first and then multi-fin device (consisting of transistor unit up to 50) is studied to develop design limitations and to evaluate their effects on the device performance. We have also investigated the impact of the number of fins (up to 50) in multi-fin structure and resulting RF parameters. Our results show that as the number of fin increases, underlap design compromises RF performance and short channel effects. The results provide technical understanding that is necessary to realize new opportunities for RF and analog mixed-signal design with nanoscale FinFETs.