Article citationsMore>>

Dogan, M., Gong, N., Maae, T.-P. and Ismail-Beigi, S. (2019) Causes of Ferroelectricity in HfO2-Based Thin Films: An Ab Initio Perspective. Physical Chemistry Chemical Physics, 21, 12150-12162.
https://doi.org/10.1039/C9CP01880H

has been cited by the following article:

Follow SCIRP
Twitter Facebook Linkedin Weibo
Contact us
+1 323-425-8868
customer@scirp.org
WhatsApp +86 18163351462(WhatsApp)
Click here to send a message to me 1655362766
Paper Publishing WeChat
Free SCIRP Newsletters
Copyright © 2006-2024 Scientific Research Publishing Inc. All Rights Reserved.
Top