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Caillieux, S., de Caro, D., Valade, L., Basso Bert, M., Faulmann, C., Malfant, I., Casellas, H., Ouahab, L., Fraxedas, J. and Zwick, A. (2006) Tetrathiafulvalene-Based Conducting Deposits on Silicon Substrates. Journal of Materials Chemistry, 13, 2931-2936.
http://dx.doi.org/10.1039/b308533c
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