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Barhai, P.K., Kumari, N., Banerjee, I., Pabi, S.K. and Mahapatra, S.K. (2010) Study of the Effect of Plasma Current Density on the Formation of Titanium Nitride and Titanium Oxynitride Thin Films Prepared by Reactive DC Magnetron Sputtering. Vacuum, 84, 896-901. http://dx.doi.org/10.1016/j.vacuum.2009.12.004

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