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Y. Hoshi and T. Kiyomura, “ITO Thin Films Deposited at Low Temperatures Using a Kinetic Energy Controlled Sputter-Deposition Technique,” Thin Solid Films, Vol. 411, No. 1, 2002, pp. 36-41. http://dx.doi.org/10.1016/S0040-6090(02)00170-0

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