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R. Siliprandi, S. Zanini, E. Grimoldi, F. Fumagalli, R. Barni and C. Riccardi, “Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process,” Plasma Chemistry and Plasma Processing, Vol. 31, No. 2, 2011, pp. 353-372. doi:10.1007/s11090-011-9286-3

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