O. Mitrofanov, M. Manfra and N. Weimann, “Impact of Si Doping on Radio Frequency Dispersion in Unpassivated GaN/AlGaN/GaN High-Electron-Mobility Transistors Grown by Plasma-Assisted Molecular-Beam Epitaxy,” Applied Physics Letters, Vol. 82, No. 24, 2003, pp. 4361-4363. doi:10.1063/1.1582373

has been cited by the following article:

• TITLE: Electrical Characterization of Traps in AlGaN/GaN FAT-HEMT’s on Silicon Substrate by C-V and DLTS Measurements

  AUTHORS: M. Charfeddine, Malek Gassoumi, H. Mosbahi, C. Gaquiére, M. A. Zaidi, H. Maaref

  KEYWORDS: AlGaN/GaN, FAT-HEMT’s, C-V, Capacitance DLTS, Deep Level

  JOURNAL NAME: Journal of Modern Physics, Vol.2 No.10, October 20, 2011

  ABSTRACT: We investigate high electron mobility transistors (HEMT’s) based on AlGaN/GaN grown by molecular beam epitaxy on Silicon substrates. The improvement of the performances of such transistors is still subject to the influence of threading dislocations and point defects which are commonly observed in these devices. Deep levels in FAT-HEMT’s are characterized by using Capacitance-Voltage (C-V) measurements, from which we can extract the barrier height and the donor concentration in the AlGaN layer. Deep Level Transient Spectroscopy (DLTS) Technique is also employed to identify defects in the heterostructure. Measurements reveal the presence of one electron trap with the activation energy E1 = 0.30 eV and capture cross-section σn = 3.59 10–19cm2. The localization and the identification of this trap have been discussed.