H. águas, R. Martins and E. Fortunato, “Plasma Dianos-tics of a PECVD System Using Different R.F. Elec Trode Configurations,” Vacuum, Vol. 56, No. 1, January 2000, pp. 31- 37.

has been cited by the following article:

• TITLE: The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition

  AUTHORS: S. Djerourou, K. Henda, M. Djebli

  KEYWORDS: Multihollow Cathode, RF (13.56 MHz) Discharge, CH4 Plasma, Self-Bias Voltage, a-C:H.

  JOURNAL NAME: Journal of Modern Physics, Vol.2 No.9, September 19, 2011

  ABSTRACT: In this work we report the measurement of the self-bias voltage of radiofrequency (RF) capacitevely coupled plasma, with a multihollow cathode and methane precursor, used for amorphous hydrogenated carbon (a- C:H) thin film deposition. The plasma is produced in the incident power and pressure ranges between 20 - 300 W and 10 - 100 mTorr, respectively. It was found that the self-bias voltage Vdc is a linear function of the square root of the incident power WRF. The relationship between the self-bias voltage and gas pressure P is established; this gives an empirical relation for (p/p0)y . From this result, the pressure p0 corresponding to the transition from hollow cathode effect to hollow cathode arc effect is determined.