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Proceedings of the 7th National Conference on Functional Materials and Applications (FMA 2010 E-BOOK)

Changsha,China,10.16-10.18,2010

ISBN: 978-1-935068-41-9 Scientific Research Publishing, USA

E-Book 2313pp Pub. Date: October 2010

Category: Chemistry & Materials Science

Price: $360

Title: Study of Etching Pits on Copper Single Crystal Grown by Vertical Bridgman Method
Source: Proceedings of the 7th National Conference on Functional Materials and Applications (FMA 2010 E-BOOK) (pp 811-813)
Author(s): Chao Yao, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Bei-jun Zhao, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Shi-fu Zhu, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Shi-hong Tang, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Zhi-yu He, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Bao-jun Chen, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Yi-bo Zhou, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Huai-an Xiao, College of Materials Science and Engineering, Sichuan University, Chengdu, China, 610064
Abstract: Copper single crystals can be widely used in the fields of neutron, X-ray monochromator and high fidelity signal transmission. In this article, a crack-free copper single crystal with integral and smooth appearance was successfully grown by the modified and non-seeded vertical Bridgman method. After being cut and polished, the as-grown crystal was analyzed utilizing a DX-2000 X-Ray diffractometer. XRD pattern with a sharp peak and high intensity of the (111) and (220) face on copper single crystal were obtained. The second order peaks of (111) crystal face were also observed. Wafers cut from the as-grown crystal were etched in the etchant mixed by nitric acid and high-purity water. Some comparatively clear metalloscope photographs of (111) and (220) face etching pits were got. The cause of the etching pits was analyzed, and the etch pit density (EPD) was calculated as about 104-106. The results show that the quality of the grown crystal is good and the crystal structure is integral.
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