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Author(s): |
Long-cheng Yin, Department of Physics, Mudanjiang Normal College, Heilongjiang Province Key laboratory of New Carbon-base Functional and Superhard Material, Mudanjiang, China, 157012
Hai-liang Huang, Department of Physics, Mudanjiang Normal College, Heilongjiang Province Key laboratory of New Carbon-base Functional and Superhard Material, Mudanjiang, China, 157012
Xian-yang He, Mudanjiang Metrological Verification & Testing Institute affiliate to Mudanjiang Bureau of Quality and Technical Supervision, Mudanjiang, China, 157012
Dan Wang, Department of Physics, Mudanjiang Normal College, Heilongjiang Province Key laboratory of New Carbon-base Functional and Superhard Material, Mudanjiang, China, 157012
Hong-yan Peng, Department of Physics, Mudanjiang Normal College, Heilongjiang Province Key laboratory of New Carbon-base Functional and Superhard Material, Mudanjiang, China, 157012
Yu-qiang Chen1, Department of Physics, Mudanjiang Normal College, Heilongjiang Province Key laboratory of New Carbon-base Functional and Superhard Material, Mudanjiang, China, 157012 |
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Abstract: |
The DC plasma chemical vapor deposition (DC-PCVD) method was a promising technique to fabricate CVD diamond coatings in industry, where it was imperative to minimize the price of synthetic diamond. Diamond films were synthesized on a cemented carbide (YG6) substrate using the gaseous mixtures of methane and hydrogen by DC-PCVD. The grow texture, surface morphologies and qualities of as-deposited samples were characterized by X-ray diffractometer (XRD), scanning election microscopy (SEM) and Raman spectra methods respectively. The experimental results showed that with the increase of deposition temperature, the grain size of diamond film grow up, while the content of grain boundaries decreased, and the diamond phase purity was enhanced. The residual stress in the film was competitive, and also increases with deposition temperature. Rockwell indention test indicated that the diamond film synthesize at 840℃ showed good adhesive with cemented carbide substrate.
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