International Conference on Information Technology and Scientific Management (ICITSM 2010 E-BOOK)

Tianjin,China,12.20-12.21,2010

ISBN: 978-1-935068-40-2 Scientific Research Publishing, USA

E-Book 1078pp Pub. Date: December 2010

Category: Computer Science & Communications

Price: $220

Title: An Analysis on New Base-Type Patterns of Garments Patternmaking
Source: International Conference on Information Technology and Scientific Management (ICITSM 2010 E-BOOK) (pp 644-647)
Author(s): Ruiping Zheng, Institute of Art and Fashion, Tianjin Polytechnic University, Tianjin, China
Shufa Chen, Institute of Art and Fashion, Tianjin Polytechnic University, Tianjin, China
Kuermanbaike Gulinuer, Institute of Art and Fashion, Tianjin Polytechnic University, Tianjin, China
Abstract: The patternmaking of garments plays an important role in fashion designing, and the pattern design is ever-changing. On the basis of original basic pattern of women, this text presents a new method about designing basic pattern by summarizing a large number of garments designing instances, and this new method can be divided into dress pattern, nightwear pattern, thin pattern and flare pattern. The patternmaking of garment will be more scientific, simple and comprehensive by using new base-type patterns.
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