The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition

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ISSN Print: 2153-1196
ISSN Online: 2153-120X
www.scirp.org/journal/jmp
E-mail: jmp@scirp.org

"The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition"
written by S. Djerourou, K. Henda, M. Djebli,
published by Journal of Modern Physics, Vol.2 No.9, 2011

has been cited by the following article(s):

[1]	Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode
	2019

[2]	Reactive-ion etching of nylon fabric meshes using oxygen plasma for creating surface nanostructures
	Applied Surface Science, 2015

[1]	Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering Journal of Vacuum Science & Technology B, 2023 DOI:10.1116/6.0002377

[2]	Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering Journal of Vacuum Science & Technology B, 2023 DOI:10.1116/6.0002377

[3]	Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode The European Physical Journal Applied Physics, 2019 DOI:10.1051/epjap/2019180193

[4]	Reactive-ion etching of nylon fabric meshes using oxygen plasma for creating surface nanostructures Applied Surface Science, 2015 DOI:10.1016/j.apsusc.2015.06.185

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