Diffusion Coefficient at Resonance Frequency as Applied to n+/p/p+ Silicon Solar Cell Optimum Base Thickness Determination

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ISSN Print: 1942-0730
ISSN Online: 1942-0749
www.scirp.org/journal/jemaa
E-mail: jemaa@scirp.org

"Diffusion Coefficient at Resonance Frequency as Applied to n+/p/p+ Silicon Solar Cell Optimum Base Thickness Determination"
written by Amadou Mar Ndiaye, Sega Gueye, Mame Faty Mbaye Fall, Gora Diop, Amadou Mamour Ba, Mamadou Lamine Ba, Ibrahima Diatta, Lemrabott Habiboullah, Gregoire Sissoko,
published by Journal of Electromagnetic Analysis and Applications, Vol.12 No.10, 2020

has been cited by the following article(s):

[1]	AC Back Surface Recombination Velocity as Applied to Optimize the Base Thickness under Temperature of an (n+-p-p+) Bifacial Silicon Solar Cell, Back …
	World Journal of …, 2023

[2]	Diffusion Coefficient at Double Resonances in Frequency and Temperature, Applied to (n+/p/p+) Silicon Solar Cell Base Thickness Optimization under Long …
	Journal of …, 2022

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