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Advances in Chemical Engineering and Science
Submission
Advances in Chemical Engineering and Science
ISSN Print:
2160-0392
ISSN Online:
2160-0406
www.scirp.org/journal/aces
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aces@scirp.org
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1.41
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"
Quartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
"
written by
Mana Otani, Toshinori Takahashi, Hitoshi Habuka, Yuuki Ishida, Shin-Ichi Ikeda, Shiro Hara
,
published by
Advances in Chemical Engineering and Science
,
Vol.10 No.3, 2020
has been cited by the following article(s):
Google Scholar
CrossRef
[1]
Boron-Silicon Thin Film Formation Using a Slim Vertical Chemical Vapor Deposition Reactor
Advances in Chemical …
,
2022
[2]
Antimicrobial properties of SiC nanostructures and coatings
Silicon Carbide Technology for …
,
2022
[3]
Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS
2020
[1]
Silicon Carbide Technology for Advanced Human Healthcare Applications
2022
DOI:
10.1016/B978-0-323-90609-8.00004-1
[2]
Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS
Micromachines
,
2020
DOI:
10.3390/mi11090799
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