Materials Sciences and Applications

Materials Sciences and Applications

ISSN Print: 2153-117X
ISSN Online: 2153-1188
www.scirp.org/journal/msa
E-mail: msa@scirp.org
"Formation and Gas Barrier Characteristics of Polysilazane-Derived Silica Coatings Formed by Excimer Light Irradiation on PET Films with Vacuum Evaporated Silica Coatings"
written by Tomoji Ohishi, Yoshimi Yamazaki,
published by Materials Sciences and Applications, Vol.8 No.1, 2017
has been cited by the following article(s):
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[1] Comparative study of perhydropolysilazane protective films
Surface Engineering, 2022
[2] Intense pulsed UV light treatment to design functional optical films from perhydropolysilazane: an alternative to conventional heat treatment processes
Journal of Materials …, 2022
[3] OPTIMIZATION OF PERHYDROPOLYSILAZANE (PHPS) FILM PROCESSING METHODS AND MOISTURE PERMEATION FOR A POTENTIAL ENCAPSULANT …
2021
[4] Process parameter optimization of a polymer derived ceramic coatings for producing ultra-high gas barrier
Materials, 2021
[5] and Hans-Joachim Egelhaaf1, 2 1Bavarian Center for Applied Energy Research (ZAE Bayern), Germany, 2Institute of Materials for Electronics and Energy Technology …
Organic Flexible Electronics …, 2020
[6] and Hans-Joachim Egelhaaf1, 2 1Bavarian Center for Applied Energy Research (ZAE Bayern), Germany, 2Institute of Materials for Electronics and Energy …
2020
[7] Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane …
2019
[8] Thin Film Encapsulation of Organic Solar Cells by Direct Deposition of Polysilazanes from Solution
2019
[9] Preparation and properties of polyurethane coatings modified by polysilazane
2019
[10] Development of Solution Processed Thin Film Barriers for Encapsulating Thin Film Electronics
Dissertation, 2019
[11] An Easy Fabricable Film for Organic Electronics Based on Phenoxy and Epoxy
2019
[12] 폴리실라잔 소재 기술동향
2018
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