Room Temperature and Reduced Pressure Chemical Vapor Deposition of Silicon Carbide on Various Materials Surface

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ISSN Print: 2160-0392
ISSN Online: 2160-0406
www.scirp.org/journal/aces
E-mail: aces@scirp.org

"Room Temperature and Reduced Pressure Chemical Vapor Deposition of Silicon Carbide on Various Materials Surface"
written by Hitoshi Habuka, Asumi Hirooka, Kohei Shioda, Masaki Tsuji,
published by Advances in Chemical Engineering and Science, Vol.4 No.4, 2014

has been cited by the following article(s):

[1]	Метилсилан. Часть I. ПриМенение в Передовых технологиях
	Химия и технология …, 2020

[2]	Non-heat assistance chemical vapor deposition of amorphous silicon carbide using monomethylsilane gas under argon plasma
	Surface and Coatings Technology, 2016

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