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World Journal of Nano Science and Engineering
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World Journal of Nano Science and Engineering
ISSN Print:
2161-4954
ISSN Online:
2161-4962
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"
Role of Chromium Intermediate Thin-Film on the Growth of Silicon Oxide (SiO
x
) Nanowires
"
written by
Anima Johari, Anoopshi Johari, Vikas Rana, M. C. Bhatnagar
,
published by
World Journal of Nano Science and Engineering
,
Vol.4 No.1, 2014
has been cited by the following article(s):
Google Scholar
CrossRef
[1]
Oxide reduced silicon nanowires
Current Applied Physics
,
2018
[2]
Growth and characterisation of platinum and palladium catalysed silicon based nanostructures for nano-device fabrication
2018
[1]
Oxide reduced silicon nanowires
Current Applied Physics
,
2018
DOI:
10.1016/j.cap.2018.02.010
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