Author(s)

Jie Wang^1,2, Lei Pan², Hua Meng³, Ruqu Han⁴, Zhipeng Huang^2*, Chi Zhang^2*

¹School of Chemistry & Chemical Engineering, Jiangsu University, Zhenjiang, China.
²China-Australia Joint Research Center for Functional Molecular Materials, Scientific Research Academy, Jiangsu University, Zhenjiang, China.
³Research Institute of Refrigeration and Thermal Engineering, College of Mechanical Engineering, Tongji University, Shanghai, China.
⁴Department of Physics, Jiangsu University of Science and Technology, Zhenjiang, China.

A facile one-step method was developed for the fabrication of hierarchical ZnO film on substrate. Neither seed nor catalyst layer is necessary for the growth of hierarchical ZnO film. Three kinds of nucleation process were found, and the influences of growth time, growth electrolyte, growth temperature on the morphology of ZnO film were evaluated. Hierarchical ZnO film can absorb more than 97% of incident photons with wavelength shorter than 380 nm. Such hierarchical ZnO film would be a promising scaffold for photoelectrochemical application.

ZnO, Hierarchical, Solution Growth, Photoelectrochemical, Water Splitting

Wang, J. , Pan, L. , Meng, H. , Han, R. , Huang, Z. and Zhang, C. (2016) One-Step Seedless and Catalyst—Free Growth of Hierarchical ZnO Film Promising for Photoelectrochemical Application. Advances in Materials Physics and Chemistry, 6, 61-76. doi: 10.4236/ampc.2016.63007.