Author(s)

Bahaa T. Chiad¹, Mohammad K. Khalaf², Firas J. Kadhim¹, Oday A. Hammadi^3*

¹Department of Physics, College of Science, University of Baghdad, Baghdad, Iraq.
²Center of Applied Physics, Ministry of Science and Technology, Baghdad, Iraq.
³Department of Physics, College of Education, Al-Iraqia University, Baghdad, Iraq.

In this work, a home-made closed-field unbalanced magnetron system for plasma sputtering purposes was constructed and operated. The effect of magnetron was introduced by comparing the obtained Paschen’s curve in existence of magnetron with and without magnetron. Characterization of Paschen’s curve as well as discharge current with gas pressure at different distances between the discharge electrodes was introduced. Optimum conditions to operate such home-made system for sputtering purpose were determined.

Physical Vapor Deposition, Sputtering, Magnetron Sputtering, Paschen’s Law

Chiad, B. , Khalaf, M. , Kadhim, F. and Hammadi, O. (2014) Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System. Open Access Library Journal, 1, 1-7. doi: 10.4236/oalib.1100650.