Author(s)

Patricia M. Perillo^*, Daniel F. Rodríguez

National Atomic Energy Commision, CAC, Buenos Aires, Argentina.

Titania nanopores were fabricated on silicon substrate. Ti thin films (600 nm) were first deposited by radio-frequency (RF) magnetron sputtering at two substrate temperatures and then anodized in glycerol electrolytes containing NH₄F. The morphology and structure were identified by means of scanning electron microscopy (SEM), X-ray diffractometry (XRD). The effect of the temperature on the Ti thin films deposited by RF magnetron sputtering and the applied voltage on nanopore morphology were investigated. Homogeneously distributed nanopores with dimensions in the range of 60 to 80 nm were obtained independently of the voltage applied during the anodization and the substrate temperature in sputtering deposition.

RF Magnetron Sputtering, TiO₂, Nanopores, Anodic Oxidation

Perillo, P. and Rodríguez, D. (2014) Formation of TiO₂ Nanopores by Anodization of Ti-Films. Open Access Library Journal, 1, 1-9. doi: 10.4236/oalib.1100630.