Author(s)

Masato Ohmukai¹, Takuya Nakagawa², Masaru Kamano³, Nobutomo Uehara³

¹Department of Electrical and Computer Engineering, Akashi College of Technology, Akashi, Japan.
²Technical Education Support Center, Akashi College of Technology, Akashi, Japan.
³Department of Electrical and Electronic Engineering, Anan National College of Technology, Anan, Japan.

ZnO films were deposited on glass substrates by means of a metal organic decomposition (MOD) method. We investigated the effect of annealing temperature, time and the number of laminated layers on the film structure on the basis of X-ray diffraction measurements. We found the optimum conditions of the temperature and the time to be 600°C and 40 minutes for the preparation, respectively. In addition, the layer-by-layer forming was not found to degrade the film from viewpoint of X-ray line width.

ZnO Film, MOD Method, Transparent Electrode, X-Ray Analysis

Ohmukai, M. , Nakagawa, T. , Kamano, M. and Uehara, N. (2014) Structural Analysis of ZnO Film Deposited by Means of Metal Organic Decomposition Method. Journal of Materials Science and Chemical Engineering, 2, 41-48. doi: 10.4236/msce.2014.211006.